Volltext-Downloads (blau) und Frontdoor-Views (grau)

Elastohydrodynamic Dewetting of Thin Liquid Films: Elucidating Underwater Adhesion of Topographically Patterned Surfaces

  • In underwater adhesion of a topographically patterned surface with a very soft material such as human skin, the elastic deformation can be large enough to achieve solid-on-solid contact not only on top of the hills but also in the valleys of the substrate topography. In this context, we have studied the dynamics of dewetting of a thin liquid film confined between a rigid, periodic micropillar array and a soft, elastic sphere. In our experiments, we observed two very distinct dewetting morphologies. For large ratios of array period to micropillar height and width, the dewetted areas tend to have a diamond-like shape and expand with a rate similar to a flat, unpatterned substrate. When the array period is reduced, the morphology of the dry spot becomes irregular and its expansion rate is significantly reduced. We developed a fully coupled numerical model of the dewetting process that reproduces the key features observed in experiments. Moreover, we performed contact mechanics simulations to characterize the deformation of the elastomer and the shape of the dewetted area in a unit cell of the micropillar array.

Download full text files

Export metadata

Additional Services

Search Google Scholar

Statistics

frontdoor_oas
Metadaten
Document Type:Article
Author:Maciej Chudak, Vaishali ChopraORCiD, René HenselORCiD, Anton A. Darhuber
URN:urn:nbn:de:bsz:291:415-3081
DOI:https://doi.org/10.1021/acs.langmuir.0c02005
ISSN:0743-7463
Parent Title (English):Langmuir
Volume:36
Issue:40
First Page:11929
Last Page:11937
Publisher:American Chemical Society
Language:English
Year of first Publication:2020
Release Date:2022/11/18
Impact:05.471 (2020)
Funding Information:H2020 Marie Sk łodowska-Curie Actions (642861)
Research Departments:Funktionelle Mikrostrukturen
Researchfields:Grenzflächenmaterialien
Open Access:Open Access
Signature:INM 2020/108
Licence (German):License LogoCreative Commons - CC BY-NC-ND - Namensnennung - Nicht kommerziell - Keine Bearbeitungen 4.0 International