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Nanopillar Diffraction Gratings by Two-Photon Lithography

  • Two-dimensional photonic structures such as nanostructured pillar gratings are useful for various applications including wave coupling, diffractive optics, and security features. Two-photon lithography facilitates the generation of such nanostructured surfaces with high precision and reproducibility. In this work, we report on nanopillar diffraction gratings fabricated by two-photon lithography with various laser powers close to the polymerization threshold of the photoresist. As a result, defect-free arrays of pillars with diameters down to 184 nm were fabricated. The structure sizes were analyzed by scanning electron microscopy and compared to theoretical predictions obtained from Monte Carlo simulations. The optical reflectivities of the nanopillar gratings were analyzed by optical microscopy and verified by rigorous coupled-wave simulations.

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Metadaten
Document Type:Article
Author:Julia Purtov, Peter Rogin, Andreas Verch, Villads Egede JohansenORCiD, René HenselORCiD
URN:urn:nbn:de:bsz:291:415-4379
URL:https://www.mdpi.com/2079-4991/9/10/1495
DOI:https://doi.org/10.3390/nano9101495
ISSN:2079-4991
Parent Title (English):Nanomaterials
Volume:9
Issue:10
Pagenumber:1495
Language:English
Year of first Publication:2019
Release Date:2022/11/18
Tag:direct laser writing; nanostructures; optical pillar gratings; photonic crystals; two-photon lithography
Impact:04.324 (2019)
Funding Information:European Research Council (340929) Directorate-General for Migration and Home Affairs (701455)
Scientific Units:Functional Microstructures
Innovative Electron Microscopy
Optical Materials
Open Access:Open Access
Signature:INM 2019/126
Licence (German):License LogoCreative Commons - CC BY - Namensnennung 4.0 International